Glow Discharge (GD) Optical Emission Spectrometers (OES) for depth profiling and bulk analysis

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Depth Profile of AL-ZN Coated Steel Sheet

Depth Profile of AL/Zn/FE Alloy

Depth Profile of a Galvanised Steel Sheet

Depth Profile of Organic Coatings

Depth Profile of aPre-Painted Steel Sheet

Depth Profile of Protective Coatings

Large Depth Profiles: Carburisation

Bulk Analysis of Cast Iron

Hard Coatings: Machining Tools

Analysis of Copper Alloys

Analysis of Multi layer Structures on Si

Quantitative Analysis of BPSG on Si

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Jobin Yvon provides simultaneous and sequential spectrometers for the bulk and surface analysis of both conductive and non-conductive samples with Radio Frequency Glow Discharge (GD) Optical Emission Spectrometers (OES). In addition, the concentration of the layer in a depth profile can be accurately determined.

The GDS is an ideal tool to investigate from the surface down to more than 150 microns with a typical depth resolution of 5 to 10 nm.

One of the most time consuming aspects in the development of a GD method for unknown samples has been the necessity to adjust the high voltage of the detectors (their sensitivity), prior to analysis. The HDD (High Dynamic range Detector) system developed by Jobin-Yvon (JY patent) allows real time, automatic optimisation of each detector.

GD-PROFILER

The JY 5000RF GD-OES from JY Emission is a simultaneous and sequential spectrometer with an RF source for depth profile analysis and for bulk analysis of conductive and non-conductive samples. It provides for fast, simultaneous analysis of solid samples for industrial control of steels, cast iron and metal alloys as well as the control of surface layers such as resins ceramic, etc. in addition, the gases nitrogen, oxygen, and hydrogen can be analyzed on the JY 5000RF.

Utilizing patented high Dynamic Detection (HDD) the system extends the dynamic range of each channel to 10¹⁰. Each detector also features real time automatic adjustment of the high voltage and gain eliminating all user adjustment of the detector.

GD-PROFILER HR

The foremost GD spectrometer: performance achieved by none other in the world.

The JY 10 000 RF gives the optimum in terms of resolution and number of elements to solve analytical problems in complex matrices.

64 elements (including gasses) can be analysed simultaneously.

Nitrogen Generator

JY Emission offers high purity nitrogen generators for all sequential and simultaneous JY GD-OES systems. The nitrogen generator allows for the analysis of far UV elements (less than 200 nm). It supplies nitrogen at 99.999% purity at flow rates from 1.5 L/min to 6.0 L/min.

Lowers the Operating Cost of your GD-OES.

The use of a nitrogen generator can significantly reduce long term operating expenses of the instrument.

Image Navigator

The IMAGE NAVIGATOR from JY Emission offers the complete analysis of any sample in less than 2 minutes. A patented fast scanning acquisition system and High Dynamic Detector system provides the large dynamic range necessary for accuracy over a large concentration range with ultra fast spectrum acquisition without pre adjustment of voltage or gain settings.

Complete Analysis in less than 2 Minutes

Windows software provides the user the ability to view up to five emission lines simultaneously to assist in method development and view potential interferences, to identify unknown elements and to perform a complete semiquantitative analysis of any sample. The IMAGE NAVIGATOR is a perfect tool for sample screening, rapid semiquantitative analysis and sample archiving. The IMAGE NAVIGATOR is available on any JY GD-OES.

Software

Quantitative Surface Analysis software is included to provide the concentration versus depth. This is especially useful in applications such as the quality control of semiconductor manufacturing. During the manufacturing of semiconductor circuits, films of a different nature are deposited on a wafer. The structure of the electronic circuit is introduced on these films by micro lithographic techniques. The original silicon wafer becomes more and more structured and therefore more and more valuable. Each deposition process must be thoroughly optimized before new film is deposited on the wafer. Test runs are performed on non-treated Silicon wafers to verify the operation of the deposition process. It is during this step of QC that the GD-OES is used to check the deposition process. The software offers complete automation for unattended on-line process control analysis!.

Additional information on applications is available in our Technical Notes.

GD OES Spectrometers

GD-PROFILER

GD-PROFILER HR

Nitrogen Generator

Image Navigator

Software