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Charles Mann Award

At FACSS 2002 FRAN ADAR of Jobin Yvon Inc. was awarded the inaugural CHARLES MANN AWARD for achievements in the field of Applied Raman Spectroscopy and Dedication to the Advancement of Raman Spectroscopy at the Annual Conference of the Federation of Analytical Chemistry and Spectroscopy Societies (FACSS)

ASTM Award of Merit

MIKE CARRABBA of Jobin Yvon Inc. has been awarded the ASTM AWARD OF MERIT, their highest honor, for his work on the E13:08 Subcommittee on Raman Spectroscopy

Stress Measurements in Silicon Devices : All you ever wanted to know

Ingrid De Wolfe and researchers at IMEC, Leuven, Belgium are renowned for their studies of microelectronics by Raman and PL. This Month, Ingrid publishes an in depth article detailing the technique and the practical considerations of Raman stress measurements. Click on the following link ‘Raman spectroscopy: about chips and stress’ for the full article from Spectroscopy Europe .

Strained Si for Sub-100 nm MOSFETs

In a further article researchers at IBM SRDC, Research Division and Microelectronics Division announce the use of Raman in the study of ultra-thin strained Si channel devices. Click on the following link for the article abstract. ‘Strained Si for Sub-100 nm MOSFETs’