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Thin Film Links Introduction Ellipsometry Applications Basic Principles Ex-Situ UVISEL In-Situ UVISEL Optical Set-up PZ 2000 PQ Ruby Software Process Control DIGISEM DIGILEM DIGITWIN PlasmaScope MULTISEM User Guide  Process Applications EPD at Interfaces EPD at Depths Optical Emission Spectroscopy Thicknesses, refractive indices and absorption constants Depth Targeting for MEMS III-V Process Control Flat Panel Display Film Thickness Thin dielectric and transparent film Real-time process monitoring Ultra-thin gate oxide (UTGO) layer thicknesses Pulsed Plasma Monitoring  Tell Me More Detailed Product Information Form Quick Request Please send me more information on:  Ellipsometry Process Control Country Your e-mail Combined OES and laser Interferometry The wide range of problems encountered in process development and production control cannot always be solved by one single technique. Optical Emission Spectroscopy (OES) provides the selectivity for small open areas and complicated plasma chemistries but gives no information about etch rate or relative thickness. Interferometry, however, provides both etch rate and thickness but is more sensitive to the optical and geometrical properties of the material. Combining OES and interferometry gives the user all the advantages of both the DIGILEM and DIGISEM in a single instrument. This gives the ability to use both techniques, either simultaneously or independently depending on the application. For example the etch rate can be determined using interferometry and the endpoint at a buried interface can be established using optical emission spectroscopy.   Applications In-situ real time control of : Endpoint Layer thickness Remaining layer thickness Trench depth Planarisation Etch and deposition rates Selectivity Contamination Multilayer monitoring Process control of III-V and related materials Failure analysis Low exposed area processes (less than 0.5%)   Typical Schematic We can offer the DIGITWIN with any combination of our sensors, such as twin OES systems for dual wavelength ratio monitoring.

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