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Thin Film Links Introduction Ellipsometry Applications Basic Principles Ex-Situ UVISEL In-Situ UVISEL Optical Set-up PZ 2000 PQ Ruby Software Process Control DIGISEM DIGILEM DIGITWIN PlasmaScope MULTISEM User Guide  Process Applications EPD at Interfaces EPD at Depths Optical Emission Spectroscopy Thicknesses, refractive indices and absorption constants Depth Targeting for MEMS III-V Process Control Flat Panel Display Film Thickness Thin dielectric and transparent film Real-time process monitoring Ultra-thin gate oxide (UTGO) layer thicknesses Pulsed Plasma Monitoring  Tell Me More Detailed Product Information Form Quick Request Please send me more information on:  Ellipsometry Process Control Country Your e-mail Dual OES Systems for Enhanced Endpoint Detection Jobin Yvon’s OES systems are also available with two monochromators, this allows two different wavelengths to be monitored simultaneously. These signals can also be ratioed in real time to enhance endpoint detection capabilities particularly for very low exposed area applications. Ratio Signal = Signal of Wavelength 1 / Signal of Wavelength 2   SCHEMATICALLY MAIN BENEFITS Reduces effects of plasma fluctuations. Increases accuracy and reliability of endpoint detection for low exposed areas.

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