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Thin Film Links Introduction Ellipsometry Applications Basic Principles Ex-Situ UVISEL In-Situ UVISEL Optical Set-up PZ 2000 PQ Ruby Software Process Control DIGISEM DIGILEM DIGITWIN PlasmaScope MULTISEM User Guide Contact Angle Laboratory Applications Automatic thin-film measurement Thin Film Metrology Surface Chemistry Surface Cleanliness HMDS Process Reflectance Difference Spectroscopy (RDS)  Process Applications EPD at Interfaces EPD at Depths Optical Emission Spectroscopy Thicknesses, refractive indices and absorption constants Depth Targeting for MEMS III-V Process Control Flat Panel Display Film Thickness Thin dielectric and transparent film Real-time process monitoring Ultra-thin gate oxide (UTGO) layer thicknesses Pulsed Plasma Monitoring  Tell Me More Detailed Product Information Form Quick Request Please send me more information on:  Ellipsometry Process Control Country Your e-mail Jobin Yvon ellipsometers combine two key elements - phase modulation and an entirely numerical data acquisition and processing system. It allows real-time measurements two orders of magnitude faster than classical ellipsometers. For industrial research or analytical laboratories, our ellipsometry products are the safest, easiest to operate, and most flexible instruments available. Founded more than 175 years ago, our company has developed the original ideas of illustrious scientists such as J.B. Soleil, Arago, Babinet... From the beginning, highly sensitive optical instruments were built to measure the properties of light and of natural samples (sugar, quinine...). The first polarimeter, by Laurent, dates back to 1872 and was already world famous at that time. Jobin Yvon-Spex has long been involved in thin films analysis through Raman spectroscopy, photoluminescence and plasma emission. Pursuing a tradition of innovation, we acquired in 1989 the license for a phase modulated ellipsometer developed in collaboration with CNRS laboratories and successfully developed a broad variety of spectroscopic ellipsometry systems. Jobin Yvon also acquired the Plasmos Laser Ellipsometer range from Philips Analytical in 2002. Our systems respond to the need of research and fabrication engineers for high performance characterisation techniques, in the semiconductor and optical thin film industries. Combined with excellence in optical instrumentation, we provide customers with expertise in materials characterisation and thin film analysis. Continuous improvement of our complete product line and analysis software provides the best solution for your specific application. Your Process Application The JY Solution Thicknesses, refractive indices and absorption constants PQ Ruby Thin dielectric and transparent film PQ Ruby Ultra-thin gate oxide (UTGO) layer thicknesses PQ Ruby Real-time process monitoring in situ UVISEL Your Laboratory Application The JY Solution Thin Film Metrology Thickness and composition Optical properties Mapping ex situ UVISEL Automatic thin-film measurement PZ 2000 Surface Chemistry, Structure Measurement real time control RDS Also look at: An explanation of Spectroscopic Ellipsometry The optical setup of the UVISEL Ellipsometry Software

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