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Thin Film Links Introduction Ellipsometry Applications Basic Principles Ex-Situ UVISEL In-Situ UVISEL Optical Set-up PZ 2000 PQ Ruby Software Process Control DIGISEM DIGILEM DIGITWIN PlasmaScope MULTISEM User Guide  Process Applications EPD at Interfaces EPD at Depths Optical Emission Spectroscopy Thicknesses, refractive indices and absorption constants Depth Targeting for MEMS III-V Process Control Flat Panel Display Film Thickness Thin dielectric and transparent film Real-time process monitoring Ultra-thin gate oxide (UTGO) layer thicknesses Pulsed Plasma Monitoring  Tell Me More Detailed Product Information Form Quick Request Please send me more information on:  Ellipsometry Process Control Country Your e-mail Principle Based on the ratio of two reflectance coefficients, ellipsometry is insensitive to the ambient conditions, and thus ideally suited for real time process monitoring. The same principle and set-up as our ex situ ellipsometers are employed, the optical heads of the system being here coupled to your reactor via two opposing viewports. Jobin Yvon ellipsometers combine a phase modulation and an entirely numerical data acquisition and processing system. These features allow for a robust design with no mechanically moving parts, and for rapid and precise measurements. High frequency modulation is far from mechanical vibrations (pumps...), which results in improved signal-to-noise ratios. Real-time Thin Film Process Control Thickness monitoring Growth and etch rate Endpoint detection Alloys composition Crystallinity Surface damage Contamination Surface temperature Plasma deposition Plasma etching Thermal oxidation CVD, sputtering MBE, MOVPE Surface cleaning Implantation Corrosion Electrochemistry Process Control Wafer-to-wafer repeatability Run-to-run control Long term stability Reactor conditioning Features Non invasive Millisecond time resolution Selectable wavelength from 0.73 to 5 eV (250 to 1700 nm) Input and output triggers Certified class 1 clean room compatible Possibility of control from an external host computer Easily adaptable modular system via optical fiber coupling Compatible with reactor pressures from UHV to > atm Compact design : compatible with tight reactor environments Options Near IR spectral extension Real time Multi-wavelength (simultaneously at 16 energies in the spectral range, in 16 ms minimum and up to 48 energies)

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