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The MULTISEM
design concept is based on an open parallel architecture consisting
of a central supervisor control unit, and a network of analytical
substations. In a cluster tool configuration, an instrumentation
unit, with its own processor and hard disk, is connected to each
chamber of the tool and is linked to the MULTISEM supervisor by a
local area network (LAN). The supervisor performs simultaneously, all
instrument control and acquisition functions via a windows type user
interface and communicates with the processing tool through a SECS II
or customised link. Support for almost all commercially available
etchers is available.
The MULTISEM is a modular
instrumentation platform, incorporating a supervisor station, and up
to 16 remote sensors and their associated controller unit. OES, UV
and laser interferometry, ellipsometry and electrostatic probing, as
well as other sensors can all be integrated into a single station to
provide unparalleled comprehensive process control. The flexibility
of the system allows the customer to tailor a unique configuration of
analytical techniques, specific to the individual process monitoring
of each chamber.
MULTI-CHAMBER MONITORING
The production of sub
micron feature semiconductor devices relies heavily on the use of
cluster tools with several chambers for the different etching or
deposition steps. Process reliability and yields are enhanced by
closed loop control, which requires the use of specific in situ
diagnostic techniques for accurate end point detection on each
chamber. The MULTISEM allows multiple endpoint detectors operating on
different chambers of a cluster tool to be controlled via a single
user interface. A SECS II link to the tool allows information such as
the current step and batch to be obtained by the MULTISEM this allows
the appropriate step to be run and informative database management to
be performed.
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