Laser Ellipsometry - PQ Ruby automatic thin dielectric and transparent film measurement

Thin Film Links

Introduction

Ellipsometry
Applications
Basic Principles
Ex-Situ UVISEL
In-Situ UVISEL
Optical Set-up
PZ 2000
PQ Ruby
Software

Process Control
DIGISEM
DIGILEM
DIGITWIN
PlasmaScope
MULTISEM
User Guide

Process Applications

EPD at Interfaces

EPD at Depths

Optical Emission Spectroscopy

Thicknesses, refractive indices and absorption constants

Depth Targeting for MEMS

III-V Process Control

Flat Panel Display Film Thickness

Thin dielectric and transparent film

Real-time process monitoring

Ultra-thin gate oxide (UTGO) layer thicknesses

Pulsed Plasma Monitoring

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PQ Ruby

The PQ Ruby tools consist of fully automatic thin dielectric and transparent film measurement systems for substrates of up to 200 mm diameter. Based on the techniques of Laser Ellipsometry and Reflectometry, the tools are capable of determining the thicknesses and optical refractive indices as well as absorption constants and reflectivity of thin films from 0 nm up to 30 µm.

Three configurations are available:

PQ Ruby LE: based on Laser Ellipsometry

PQ Ruby R: based on Reflectometry

PQ Ruby LE/R: combines Laser Ellipsometry and Reflectrometry into one tool

All configurations have cassette-to-cassette capability.

The PQ Ruby tools have been specially designed for in-line process control in IC production. They can also be used in R&D environments. Transparent films - such as ultra-thin gate oxides, nitrides, low-k stacks, CMP oxides and ARC - can be analyzed, as well as absorbing films such as silicon on insulator (SOI), polysilicon on oxide and high-k materials.

Simultaneous evaluation of multi-layers such as oxide nitride oxide (ONO), oxide poly-oxide (OPO) and poly-silicon on oxide can be carried out using the infrared DIR option.

The system has been designed for measurements in patterned wafers and can be managed optionally by SECS/GEM software.

In production, a throughput of more than 80 substrates per hour is achievable.

Key applications

The PQ Ruby combines the best features of two instruments:

Ultra-thin gate oxides: unique accuracy due to Laser Ellipsometry

193 nm ARC & resist: new applications due to a built-in reflectometer (from 186 nm - 950 nm)

SOI & poly-Si on oxide: unique infra-red option for measuring (poly-) Si on oxide

The PQ Ruby Ellipsometer was previously sold by Philips Analytical, Jobin Yvon acquired the product line in November 2002.

PQ Ruby Laser Ellipsometer

PQ Ruby

Key applications