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Multichannel OES for Plasma Analysis and Control |
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The system features a Jobin Yvon imaging spectrograph coupled to a 2048 pixel CCD detector. These high quality optics, combined with enhanced digital signal filtering provide a high dynamic range, sensitive OES system. In addition to providing accurate endpoint solutions on processes with very low exposed areas (<0.2%), it can also provide valuable plasma and chamber condition information, for example plasma composition and impurities. The system is highly portable with an integral keyboard and flat panel display. Alternatively, it can be supplied as an OEM version for embedding by plasma etcher manufacturers. The systems can be networked together to provide cluster tool control via a single user interface. The PlasmaScope is the latest addition to our comprehensive range of process control products and combined with our almost 20 year's experience in the field of plasma control, enhances our ability to provide a tailored solution to your needs.
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Jobin
Yvon are proud to announce the latest addition to their
semiconductor process control range. The PlasmaScope is a
sophisticated multichannel Optical Emission Spectrometer (OES) with
advanced end point detection for plasma etch and chemical vapour
deposition (CVD) applications.
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